Graphite for purification and coatings
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High purity graphite
Mersen has developed processes designed to significantly improve the physicochemical properties of materials, particularly when required for high-tech applications subjected to high stresses.
Mersen offers the ETV-ICP (Electro Thermal Vaporization & Inductively Coupled Plasma) analytical method to measure the graphite purity.
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High-tech constraints of semiconductor and PV industries
Purity constraints:
- Our purity processes allow us to achieve extremely low impurity levels, to below 5 ppm.
- The ETV-ICP method is used to detect and monitor impurities to levels below 5 ppb.
Cleanliness constraints:
- Vitreous Carbon Impregnation (VCI) was developed to reduce particle emissions and the vacuum outgassing of materials, particularly for semi-conductor applications.
Resistance to reagents used in plasma processes:
- Mersen products can be coated with a thin layer of pyrolitic carbon thereby reducing the material's permeability to reactive products to a minimum, particularly for semi-conductor applications.
- In order to further enhance the resistance to process reagents, Mersen proposes core impregnation with resin to reduce porosities.
Resistance to hydrogen above 900 °C, MOCVD reagents, and strong acids (HCL, HF)
- Mersen has mastered the deposition of silicon carbide thin films which provides unequalled protection of graphite equipment in particularly harsh environments.
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Product literature
Technical documentation
07/03/2017