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équipement graphite MOCVD épitaxie Mersen
graphite grain fin Mersen

Graphite for purification and coatings

Mersen: high purity graphite for semiconductor and PV industry controlled with the ETV ICP OES method
Mersen: high purity graphite for semiconductor and PV industry controlled with the ETV ICP OES method
  • High purity graphite

    Mersen has developed processes designed to significantly improve the physicochemical properties of materials, particularly when required for high-tech applications subjected to high stresses.

    Mersen offers the ETV-ICP (Electro Thermal Vaporization & Inductively Coupled Plasma) analytical method to measure the graphite purity.

  • High-tech constraints of semiconductor and PV industries

    Purity constraints:

    • Our purity processes allow us to achieve extremely low impurity levels, to below 5 ppm.
    • The ETV-ICP method is used to detect and monitor impurities to levels below 5 ppb.

    Cleanliness constraints:

    • Vitreous Carbon Impregnation (VCI) was developed to reduce particle emissions and the vacuum outgassing of materials, particularly for semi-conductor applications.
    graphite grain fin Mersen

    Resistance to reagents used in plasma processes:

    • Mersen products can be coated with a thin layer of pyrolitic carbon thereby reducing the material's permeability to reactive products to a minimum, particularly for semi-conductor applications.
    • In order to further enhance the resistance to process reagents, Mersen proposes core impregnation with resin to reduce porosities.

    Resistance to hydrogen above 900 °C, MOCVD reagents, and strong acids (HCL, HF)

    • Mersen has mastered the deposition of silicon carbide thin films which provides unequalled protection of graphite equipment in particularly harsh environments.
    équipement graphite MOCVD épitaxie Mersen
  • Product literature

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